Analysis of a second peak of electron density observed in high-power impulse magnetron sputtering plasma using a Langmuir probe
JAPANESE JOURNAL OF APPLIED PHYSICS(2024)
摘要
Plasma characteristics of a high-power impulse magnetron sputtering (HIPIMS) for copper deposition were investigated using a time-resolved Langmuir probe to explore HIPIMS discharge physics. Various discharge frequencies and pulse widths were employed while operating the HIPIMS in a constant current mode. Waveforms of the HIPIMS cathode current remained constant throughout the HIPIMS voltage pulse. It was found that electrons exhibited a bi-Maxwellian energy distribution both during and after the HIPIMS pulse. After the HIPIMS pulse, plasma density built up to a second peak while the bulk electron temperature quickly decreased. By examining the effect of pulse width and discharge frequency on the temperature of hot electrons through Langmuir I-V curves, it is suggested that the hot electron ionization contributed to the occurrence of the second peak.
更多查看译文
关键词
Langmuir probe,hot electron,Penning ionization,ion density,electron density,plasma physics
AI 理解论文
溯源树
样例
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要