Low-temperature bonding of glasses: The role of plasma-engrafted surface amino groups
JOURNAL OF THE AMERICAN CERAMIC SOCIETY（2024）
摘要
Low-temperature ( NH3) plasma treatment remarkably strengthened the bonding strength (>1 J/m(2)) at the annealing temperature of 150 degrees C. The improvement was achieved even when only one side of the bonded surfaces was plasma-treated. X-ray photoelectron spectroscopy revealed that the two-step plasma treatment generated Si-NH2 groups on the topmost surface. Upon the annealing (<200 degrees C), the engrafted Si-NH2 was desorbed from the bonded interface, indicating that the Si-NH2 effectively reacted with Si-OH on the other side to form Si-O-Si covalent bonds. This study contributes to understanding of the role of surface functional groups for bonding reaction. Furthermore, the method proposed here would be promising as a production technology because it enables glass bonding at lower temperatures with a simple plasma system.
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关键词
adhesives/adhesion,reaction bonding,surface modification
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