Dependence of surface dose on atomic number in megavoltage photon beams

MEDICAL PHYSICS(2024)

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摘要
BackgroundSurface dose in megavoltage photon radiotherapy has a significant clinical impact on the skin-sparing effect. In previously published works, it was established that the presence of medium atomic number (Z) absorbers, such as tin, decreases the surface dose. It was concluded that high-Z absorbers, such as lead, increase the surface dose, relative to medium-Z absorbers, due to the increased contributions from photoelectrons and electron-positron pairs.PurposeThe purpose of this investigation is to revisit these conclusions in the context of photon beams from modern linacs.MethodsA metric estimating the relative intensity of charged particles emitted in the forward direction, If${I}_f$, was proposed using cross-sections for the photon interactions. The If${I}_f$ values were calculated for various absorbers using energy spectra of 6 and 10 MV photon beams from a Varian TrueBeam linac. Monte Carlo (MC) simulations were performed using TOPAS MC code to calculate the surface dose for various absorbers. Surface dose measurements were performed with 6 and 10 MV photon beams with tin and lead absorbers.ResultsThe If${I}_f$ values were found to decrease as a function of Z for both 6 and 10 MV photon beams indicating that the surface dose from electrons emitted in the forward direction consistently decreases with increasing Z. With the increasing Z of the absorbers, both experimental and MC-calculated surface dose decreased without exhibiting a minimum at medium-Z absorbers. The surface dose for lead and tin was determined to be within 1% of each other for both 6 and 10 MV photon beams using MC simulations and experimental measurements. Therefore, no statistically significant difference in surface dose was found between the tin and lead absorbers disproving the presence of any minima in the surface dose versus the Z curve as has been reported in the literature.ConclusionsSurface dose for modern photon beams can be reduced using both medium and high Z absorbers since a consistent decrease in surface dose was found with increasing absorber Z.
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关键词
atomic number dependence,megavoltage photon beams,Monte Carlo,surface dose
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