Sustainable Environmental Technologies for Advanced Semiconductor Manufacturing Intelligent FAB

Hyun Chul Lee,Sehyeong Oh,Dong Sik Yang,Min Seok Koo,Dong Jin Ham,Joonseon Jeong, Sungwoo Kang, Jaehee Chang,Hyeon-Su Heo,Mijong Kim, Jonghyun Ha,Su Keun Kuk,Dong Jin Lee, Jai Young Chung, Dongwook Kim, Jaeeun Kim, Jong-Min Lee,Hyuk Jae Kwon,Jinkyu Kang,Jae-Young Kim, Yu Kyung Jung, Wooyong Shim, Seung Hoon Song,Jinha Kim, Jaesoo Lee, Dohoon Kim, Junghun Nam, Da-Hee Lee, Hojun Choi,Se-Yeon Kim, Min-Soo Suh, Sangyoon Shin,JinHo Kim,Yanfang Chen,Hwajin Kim

2023 International Electron Devices Meeting (IEDM)(2023)

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摘要
It is of great importance to quickly remove airborne molecular contaminants (AMC) which cause defects during manufacturing process. To this end. it may be essential to accurately predict the spatiotemporal distribution of AMC which strongly depends not only on the flow patterns inside a cleanroom, but also on their source characteristics such as magnitude and location. Also, in FABs, particulate matter (PM) as well as other air pollutants (e.g., volatile organic compounds (VOCs), acid and alkaline gases, and heavy metals) has been controlled to maintain product quality, improve yields, protect equipment, and ensure worker safety. Those approaches for the intelligent FAB will provide sustainable environmental control solution for the advanced semiconductor manufacturing intelligent FAB.
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关键词
Semiconductor Industry,Advanced Semiconductor Manufacturing,Heavy Metals,Air Pollution,Manufacturing Process,Volatile Organic Compounds,Environmental Control,Source Characteristics,Reactive Oxygen Species,Photocatalytic,Air Quality,Removal Efficiency,Zeolite,Turbulent Flow,Secondary Formation,Water Washing,Carbon Capture,Large Eddy Simulation,Reynolds-averaged Navier–Stokes,CO2 Utilization,Secondary Aerosol Formation,Spillway,Secondary Aerosol,Air Purification,Carbon Capture Technologies,Air Quality Control,Low Energy Efficiency,Simple Washing,CO2 Capture
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