14nm High-Performance MTJ with Accelerated STT-Switching and High-Retention Doped Co-Pt Alloy Storage Layer for 1Znm MRAM

Masahiko Nakayama,Soichi Oikawa,Chikayoshi Kamata, Masaru Toko, Shogo Itai, Rina Takashima,Hideyuki Sugiyama, Kenji Fukuda, Takeo Koike,Masumi Saitoh,Junichi Ito,Katsuhiko Koi

2023 International Electron Devices Meeting (IEDM)(2023)

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摘要
We demonstrate a novel 14nm magnetic tunnel junction (MTJ) for achieving high-retention and high-speed writing simultaneously in 1Z (15-14) nm Spin-Transfer-Torque (STT) MRAM. We developed a new Accelerated STT-switching and High-Retention MTJ (AccelHR-MTJ) using storage layer (SL) composed of high-retention doped Co-Pt alloy layer on CoFeB switching accelerating layer. Excellent performances such as high-retention of >10 years at 90°C and high-speed writing down to 5ns were demonstrated in our 14nm AccelHR-MTJ based on the design concept established by micromagnetic simulations. This MTJ technology enables high-density, high-speed, and low-cost 1Znm STT-MRAM toward storage class memory (SCM) applications.
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关键词
Doped Layer,Doped Alloy,Tunnel Junction,Micromagnetic Simulations,Magnetic Field,Pulse Width,High Retention,Voltage Pulses,Magnetic Anisotropy,Switching Rate,Exchange Coupling,Perpendicular Magnetic Anisotropy,Film Stack
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