Scaling the SOT track – A path towards maximizing efficiency in SOT-MRAM

S. Van Beek, K. Cai, F. Yasin,H. Hody, G. Talmelli, V.D. Nguyen, N. Franchina Vergel, A. Palomino,A. Trovato, K. Wostyn,S. Rao,G.S. Kar, S. Couet

2023 International Electron Devices Meeting (IEDM)(2023)

引用 0|浏览0
暂无评分
摘要
We demonstrate, for the first time, the functionality of a scaled perpendicular spin-orbit torque (SOT)-MRAM where the SOT layer and magnetic tunnel junction (MTJ) pillar exhibit comparable dimensions. This novel design leads to a significant reduction in the power consumption (63% decrease), an enhancement in endurance (>10 15 cycles), and a reduction in bit-cell area. Systematic investigations on device scaling are performed, highlighting the importance of SOT track scaling as a path to enhance the device performance by eliminating power consumption outside the MTJ pillar region. Furthermore, the hybrid free layer stack design offers a potential solution for scaling MTJ dimensions, as it enables low switching current and sufficient retention down to 20 nm.
更多
查看译文
关键词
Spin-orbit Torque,Endurance,Power Consumption,Device Performance,Current Switching,Tunnel Junction,Free Layer,Significantly Improved,Length Scale,Integration Process,Hysteresis Loop,Bit Error Rate,Conventional Devices,Technology Node,Track Width
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要