Multi-beam phase mask optimization for holographic volumetric additive manufacturing
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII(2024)
Abstract
The capability of holography to project three-dimensional (3D) images and
correct for aberrations offers much potential to enhance optical control in
light-based 3D printing. Notably, multi-beam multi-wavelength holographic
systems represent an important development direction for advanced volumetric
additive manufacturing (VAM). Nonetheless, searching for the optimal 3D
holographic projection is a challenging ill-posed problem due to the physical
constraints involved. This work introduces an optimization framework to search
for the optimal set of projection parameters, namely phase modulation values
and amplitudes, for multi-beam holographic lithography. The proposed framework
is more general than classical phase retrieval algorithms in the sense that it
can simultaneously optimize multiple holographic beams and model the coupled
non-linear material response created by co-illumination of the holograms. The
framework incorporates efficient methods to evaluate holographic light fields,
resample quantities across coordinate grids, and compute the coupled exposure
effect. The efficacy of this optimization method is tested for a variety of
setup configurations that involve multi-wavelength illumination, two-photon
absorption, and time-multiplexed scanning beam. A special test case of
holo-tomographic patterning optimized 64 holograms simultaneously and achieved
the lowest error among all demonstrations. This variant of tomographic VAM
shows promises for achieving high-contrast microscale fabrication. All testing
results indicate that a fully coupled optimization offers superior solutions
relative to a decoupled optimization approach.
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