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Coater/developer-based Patterning Techniques to Achieve Tight Pitches with 0.33 NA Single Exposure

Kanzo Kato,Seiji Nagahara,Lior Huli,Nathan Antonovich,David Hetzer,Steven Grzeskowiak,Alexandra Krawicz,Eric Liu,Nayoung Bae,Akiteru Ko,Satoru Shimura,Shinichiro Kawakami, Dinh Conque,Takahiro Kitano,Luciana Meli,Indira Seshadri,Martin Burkhardt,Karen Petrillo

International Conference on Extreme Ultraviolet Lithography 2023（2023）

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Key words
Line Edge Roughness,Patterning Materials,Nanolithography Techniques,Nanoprobing,High-Resolution Patterning
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