15 GHz GaN Hi-Lo IMPATT Diodes With Pulsed Peak Power of 25.5 W

IEEE TRANSACTIONS ON ELECTRON DEVICES(2023)

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摘要
The p(+) -n-n(-) -n(+) structure, known as Hi-Lo structure, was investigated in gallium nitride (GaN) single-drift-region (SDR) impact ionization avalanche transit-time (IMPATT) diodes to improve the output power and efficiency. The 15 GHz GaN Hi-Lo IMPATT diode was designed according to the Scharfetter and Gummel model under realistic conditions, suppressing the tunneling current ( < 10(-4) cm(2)) and breakdown voltage ( < 400 V). Even in such conditions, the calculated efficiency was higher than that of the p(+) -n abrupt junction structure and the improvement of RF characteristics was expected. The fabricated GaN Hi-Lo IMPATT diodes showed a clear avalanche breakdown and a pulsed microwave oscillation in the frequency range from 15 to 17 GHz. The maximum peak output power of 25.5 W and the efficiency of 2% were achieved, showing the highest values on microwave band GaN IMPATT diodes, and we confirmed that the Hi-Lo structure is effective for the high-power and high-efficiency operation of GaN IMPATT diodes.
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关键词
Gallium nitride,Schottky diodes,Junctions,Electric fields,Tunneling,Doping,Power generation,Avalanche breakdown,gallium nitride (GaN),impact ionization avalanche transit time (IMPATT) diode,microwave oscillation,vertical p-n diode (PND)
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