In-situ methyl red doped MoS2 field effect transistor made by atomically thin MoS2 channel

Here we present the effects of Methyl Red (MR) doping on the electrical properties of the MoS2 field effect transistor (FET) in in-situ experimental system where the doping and electrical measurement are carried out in a single ultra-high vacuum chamber. A single-layered MoS2 flake was used as channel material for the FET preparation. N-type doping by MR was confirmed by the left shift of threshold voltage (Vth) and the surface vibrational change measured by Raman spectroscopy. The n-doping by MR is implied by the Fermi level shift towards greater binding energy with MR coverage, as proven by an X-ray photoelectron spectroscopy (XPS) measurement. It is estimated from XPS that the MoS2-FET device may detect the doping effect from the submonolayer MR. MR was detected on the MoS2 surface by the Time-of-Flight Secondary Ionization Mass Spectroscopy (ToF-SIMS). The findings may pave the way for innovations in electronic device design, with potential implications for fields ranging from nanoelectronics to sensor technology.