Structure and strain of CdS nanofilms on Au(111) during electrochemical atomic layer deposition growth
APPLIED SURFACE SCIENCE(2024)
摘要
X-ray scattering is used to characterise the initial stages of the growth of CdS on Au(111) surfaces via electrochemical atomic layer deposition (E-ALD). This work characterises E-ALD films using a unique in-situ setup, allowing for X-ray reflectivity and diffraction data to be obtained to characterise the growth process of the CdS film. Structural information, as well as information concerning growth rates, roughness and strain as a function of the stage in the growth process, are obtained to provide a unique perspective of the early stages of deposition for this methodology. The results show the self-limiting, linear growth rate of CdS films that are wurtzite in structure, are highly epitaxial with the underlying Au substrate, and exhibit little to no chemical impurities during the deposition procedure.
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关键词
Electrochemical Atomic Layer Deposition,Epitaxy,CdS Thin Film,X-ray Scattering,Surface X-ray Diffraction,CdS electrodeposition
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