Microstructure and Mechanical Properties of AlTiVCuN Coatings Prepared by Ion Source-Assisted Magnetron Sputtering

The AlTiVCuN coatings were deposited by magnetron sputtering with anode layer ion source (ALIS) assistance, and the microstructure and mechanical properties were significantly affected by the ion source power. With increasing the ion source power from 0 to 1.0 kW, the deposition rate decreased from 2.6 to 2.1 nm/min, and then gradually increased to 4.0 nm/min at 3.0 kW, and the surface roughness gradually decreased from 28.7 nm at 0 kW to 9.0 nm at 3.0 kW. Due to the enhanced ion bombardment effect, the microstructure of the coatings changed from a coarse into a dense columnar structure at 1.0 kW, and the grain size increased at higher ion source powers. All the coatings exhibited c-TiAlVN phase, and the preferred orientation changed from the (220) to the (111) plane at 3.0 kW. Due to the low Cu contents (1.0 similar to 3.1 at.%), the Cu atoms existed as an amorphous phase in the coatings. Due to the microstructure densification and high residual stress, the highest hardness of 32.4 GPa was achieved for the coating deposited at 1.0 kW.