Fabrication and high-temperature tribological performance of doped diamond film with B, N, and Si elements

The diamond film is prone to oxidation in environment above 600 degrees C, making it difficult to maintain good wear resistance at high-temperatures. The high temperature oxidation resistance of diamond films can be improved through multiple doping. However, its wear resistance and anti-friction performance during high-temperature processing remain to be studied. In this study, single-doped, co-doped, and multi-doped diamond films with B, N, and Si doping combinations were fabricated on the surface of cemented carbide substrates. Performance characterization and high-temperature friction experiments were carried out on these films. The results show that B-doping can enhance wear resistance at high temperatures, N-doping can improve hardness, and Si-doping can reduce the coefficient of friction (CoF) of the diamond film. The multi-doped diamond film exhibits a comprehensive improvement effect due to the combination of different doping elements. During the hightemperature friction process, its CoF is significantly lower than that of undoped diamond film, resulting in a relatively high surface finish of the silicon nitride ball friction against it. Additionally, its excellent hightemperature wear resistance leads to minimal grain wear on the film surface and a low degree of transition from diamond to graphite phase on the surface. This study provides valuable insights for the application of multiple doped diamond films in high-temperature processing.