The influence of chemical etching on the surface quality of phase components

Abstract Large-aperture fused silica phase optical components such as continuous phase plate (CPP) are widely used in large-scale laser devices to achieve beam homogenization and improve beam quality. However, under the action of high-energy lasers, their lower damage threshold seriously restricts their service life and increases cost of using. Compared with other fused silica components, chemical processing technology with hydrofluoric acid solution (HF) is lacking in the processing of phase components because the residual root mean square value (RMS) of phase elements is very high, and it can not guarantee this. Therefore, it is necessary to carry out research on the influence of chemical treatment on phase components. In this paper, we improved the chemical treatment process to achieve the change of residual RMS value not more than 3 nm, and improved the ability of resisting laser damage that the damage threshold of 29J/cm 2 was obtained under the test conditions 351nm@3ns. Finally, we successfully mastered the chemical control process of phase components and applied it to the CPPs as other fused quartz materials engineering production process.