Enhanced pseudo-atomic layer deposition of antimony telluride thin films by co-injecting NH3 gas with both precursors
Journal of Materials Chemistry C(2023)
摘要
This work proposed an enhanced deposition method of antimony telluride (Sb 2 Te 3 ) thin films, which allowed facile growth at high temperatures (> 150 °C).
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关键词
telluride thin films,thin films,antimony,pseudo-atomic,co-injecting
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