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The Barriers for Electron and Hole Injection from Si Substrate into the RF Magnetron-Deposited In2O3 : Er Films

K. V. Feklistov,A. G. Lemzyakov,A. A. Shklyaev,D. Yu. Protasov,A. S. Deryabin,E. V. Spesivsev,D. V. Gulyaev,A. M. Pugachev,D. G. Esaev

Izvestiya Vysshikh Uchebnykh Zavedenii Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering（2023）

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