Material Characterisation of LPCVD SiN and Understanding Loss Behavior
2023 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)（2023）
Key words
a-silicon intermediate layer,a-silicon waveguide layer,cut-back method,impurities,light amplification,LPCVD,narrow-linewidth laser post III-V gain medium microtransfer printing,oxide top cladding,SEM image,Si/int,SiN/bin,spiral length variation,waveguides losses,wavelength 1550.0 nm
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