Improvement of MoS2 Film Quality by Solid-Phase Crystallization from PVD Amorphous MoSx Film

Ryo Ono,Shinya Imai,Takamasa Kawanago,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi

2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)（2023）

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摘要

Physical vapor deposited Mos2 film was improved via solid-phase crystallization (SPC) from the amorphous phase. Under the same SPC conditions, better film quality was observed for an amorphous-MoS x (a- MoS x ) film than for a well-crystallized Mos2 film. This result is attributed to the S/Mo ratio in the a-MoS x film before SPC being greater than that in the well-crystallized film, indicating that the a-MoS x film contained sufficient sulfur prior to the SPC.

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关键词

physical vapor deposition (PVD),molybdenum disulfide (MoS2),solid-phase crystallization (SPC)

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