2 O

Ultrathin Atomic-Layer-Deposited In2O3 Radio-Frequency Transistors with Record High fT of 36 GHz and BEOL Compatibility

2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)(2023)

引用 0|浏览0
暂无评分
摘要
In this work, we report back-end-of-line (BEOL) compatible In 2 O 3 RF transistors with cut-off frequencies (f T ) up to 36GHz, which is the highest among all metal oxide semiconductor channel RF transistors to date. Due to the outstanding transport properties and high scalability of In 2 O 3 , record-high f T value can be achieved with V DS at $0.8 \mathrm{~V}$ and V GS at −0.8 V on 2-nm thick, 40 nm-long channel devices. This work demonstrates the first ever BEOL oxide RF transistor with mm-Wave band operation frequency. In addition to improve the performance at Si CMOS clock frequencies for 3D integrated circuits (IC), it also offers the possibility for potential applications in future energy-efficient 6 G wireless communication devices.
更多
查看译文
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要