Conformal TiO$_2$ aerogel-like films by plasma deposition: from omniphobic antireflective coatings to perovskite solar cells photoelectrodes

The ability to control porosity in oxide thin films is one of the key factors that determine their properties. Despite the abundance of dry processes for the synthesis of oxide porous layers, the high porosity range is typically achieved by spin-coating-based wet chemical methods. Besides, special techniques such as supercritical drying are required to replace the pore liquid with air while maintaining the porous network. In this study, we propose a new method for the fabrication of ultra-porous titanium dioxide thin films at room or mild temperatures (T lower or equal to 120 degrees Celsius) by the sequential process involving plasma deposition and etching. These films are conformal to the substrate topography even for high-aspect-ratio substrates and show percolated porosity values above 85 percent that are comparable to advanced aerogels. The films deposited at room temperature are amorphous. However, they become partly crystalline at slightly higher temperatures presenting a distribution of anatase clusters embedded in the sponge-like structure. Surprisingly, the porous structure remains after annealing the films at 450 degrees Celsius in air, which increases the fraction of the embedded anatase nanocrystals. The films are antireflective, omniphobic, and photoactive becoming super-hydrophilic subjected to UV light irradiation The supported percolated nanoporous structure can be used as an electron-conducting electrode in perovskite solar cells. The properties of the cells depend on the aerogel film thickness reaching efficiencies close to those of commercial mesoporous anatase electrodes. This generic solvent-free synthesis is scalable and is applicable to ultra-high porous conformal oxides of different compositions with potential applications in photonics, optoelectronics, energy storage, and controlled wetting.