Thermophoretic efficiency in the MCVD process: A CFD modeling

Rubens Cavalcante da Silva, Paulo Jorge Duda de Morais,Andre Carvalho

2023 INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS, OMN AND SBFOTON INTERNATIONAL OPTICS AND PHOTONICS CONFERENCE, SBFOTON IOPC（2023）

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摘要

The thermophoretic efficiency in the modified chemical vapour deposition (MCVD) process has been numerically determined under specified conditions of temperature and velocity field in the silica deposition tube. A CFD code was used to solve a steady-state numerical model of the MCVD process. The cumulative efficiency of SiO2 and GeO2 deposition was calculated along the tube length, yielding to a maximum value of 42% and 37% respectivelly.

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关键词

MCVD, CFD, Thermophoretic Efficiency

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