Influence of sputter pressure on magnetic and structural properties of Permalloy thin films

Well-defined and technically relevant domain configurations are sought in patterned magnetic thin films. We used Magnetic Force Microscopy to investigate these in square-patterned Permalloy films. The films were prepared using dc sputter deposition by varying the Argon pressure from 1.5 x 10(-3) to 30.0 x 10(-3) mbar. The Landau domain configuration was found in films prepared at 1.5 x 10(-3) mbar pressure. With an increase in pressure, tulip and irregular domains were consecutively formed. Based on magnetic and structural characterizations, an increase in coercivity and a decrease in Permalloy film density were observed at the same time.