A Study on the Multi-parameter Modulation of the Light Field in 4+1 Beam Laser Interference

He Wen,Li Li,Lu Wang, Tong Zhang, Hao Li,Zuobin Wang

2023 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)(2023)

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摘要
This study delves into the modulation of multiple parameters in the beam of a 4+1 beam laser interference lithography system. Simulations and analyses were executed from four aspects—initial phase, angle of incidence, azimuthal angle, and polarization—to understand the transformations in the two-dimensional/three-dimensional interference patterns post-modulation. Findings indicate that wave vector fundamentally determines the specific lattice structure of the interference light field. Although a four-beam setup can realize all 14 types of Bravais photonic crystals, laser interference involving more than four beams, which generates compound lattice structures, continues to possess remarkable value in material science and photonics
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关键词
laser interferometric lithography,light field simulation,multi-parameter modulation
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