Precise control of the catalyst interface at the atomic level

The development of high-performance catalysts is an effective method to solve the severe situation in global climate change. The properties at the catalyst interface are crucial for determining the performance of catalysts. Atomic-layer deposition (ALD) can realize accurate control of the interface at the atomic level because of the self-limiting growth of materials. There are two main reasons for this phenomenon: (1) ALD offers chemical flexibility to enable building of multicomponent heterogeneous catalysts; (2) ALD can help to control substances on complex catalyst structures to produce highly conformal and uniform films, and the layer thickness can be controlled precisely at the atomic level. Herein, we summarize recent progress in catalytic materials made by ALD. We discuss in detail several common strategies for ALD to regulate active interfaces, such as construction of synergistic catalysts, as well as regulation of adsorption/desorption energy, electronic structure, and protection at the interface. Finally, we summarize the challenges of ALD technology in energy storage and transformation, and look forward to future development of ALD technology. This mini-review details the research status of atomic-layer deposition in regulating the active interface of catalysts, and predicts its future development trends with regard to catalysis.