Theoretical study of the pressure-induced structural phase transition of VO2

PHYSICAL REVIEW B(2023)

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摘要
High pressure technology is an effective method for studying whether there is Mott or Peierls phase transition (PT) from insulator to metal phase. It is unclear whether there is a Mott or Peierls PT in the ambient M1/R the high-pressure X phase for bulk VO2. Based on first-principles calculation, insulator M1 semimetallic X and metallic R semimetallic X PT path were studied. During the pressurization of the ambient M1 phase, it will transform into two nearly degenerate intermediate phases of M1' and M1''. The M1'' phase has a significantly lower band gap (no zero band gap) owing to its relatively longer length of V-V V-V shorter bond and V-O bond. The M1'' X path is the more probable route owing to its lower potential barrier and shorter moving route of V atoms relative to those of M1' X path. Those V atoms at the (002) crystal plane of crystal cell will shuffle nearly along the [100] crystal direction as volume pressurization in the M1'' X path, while the averaging of V-V spacing occur and the band gap gradually decreases to zero or even a negative value. Uniaxial stressing of the metal R phase along [100] or [010] crystal direction leads to the CaCl2-type orthogonal metal phase (O phase, space group No. 58, Pnnm). Upon cooling the O phase under high pressure, it will transform to M1'' and then the X phase. Those V atoms at the (002) crystal plane of crystal cell continuously shuffle along the [10-1] crystal direction in the O M1'' path, moreover the difference in longer and shorter V-V bond lengths tends to increase and a new dimerization of the V-V dimers appears. The PT paths from the semiconductor M1 ? semiconductor M1'' semimetal X phase and from metal R metal O phase only involve geometrically structural PT. Especially, it is a typical reconstruction-type and martensiticlike PT, and no PT of electronic structure from semiconductor to metal phase is involved in the path from semiconductor M1'' semimetal X phase. The structural PT path from metal O semiconductor M1'' phase is a typical Peierls PT or pseudo Mott PT within our DFT+U calculations even though the Coulomb repulsion between electrons is always present and works. The Coulomb repulsion between electrons cannot cause the electronic structural PT to happen properly.
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