Molybdenum Thin Film Formation from Molybdenum Nitride Deposited by Plasma-enhanced Atomic Layer Deposition with Hydrogen-permeable Mechanical Capping Layer

In this study, we developed a Mometal thin film depositionprocessconsisting of two steps: Mo2N thin film deposition usingplasma-enhanced atomic layer deposition, followed by rapid thermalannealing. The mechanism underlying the reduction of Mo2N during the post-deposition annealing was investigated. Agglomerationduring the reduction of Mo2N to Mo was successfully suppressedby using a hydrogen-permeable mechanical capping layer. Finally, aMo thin film formation process with low resistance, even at a thicknessof 5 nm, was achieved.