90 nm GaN Technology for Millimeter-Wave Power Applications to W-Band and Beyond.

Puneet Srivastava,David F. Brown, Louis Mt. Pleasant,Nicholas C. Miller,Michael Elliott,Ryan Gilbert, John R. Jones,Wenhua Zhu, Hong M. Lu, Douglas M. Dugas,Kanin Chu

DRC(2023)

Cited 1|Views11
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Abstract
Millimeter-wave applications above Ka-band have become increasingly important for the defense sector. With the overcrowded spectrum at lower microwave frequencies, more systems are demanding the use of spectrum space at V-, and W-band with wider bandwidth. Gallium-Nitride (GaN) has intrinsic capability to enable its high-frequency performance, allowing the capability for solid-state technology for high-power millimeter wave applications [1]. In order to address the DoD needs and to provide a technology platform, BAE Systems is developing a “Scaled GaN HEMT Technology” that offers the required gain and power added efficiency at V- and W-band applications while still providing sufficient output power density. This paper describes the results from BAE Systems on-going efforts on 90 nm GaN Technology development. Maturation of the 90 nm GaN process, is one of the next key objectives within the BAE Systems foundry.
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Key words
BAE systems foundry,gallium nitride,GaN/int,high-frequency performance,high-power millimeter wave applications,intrinsic capability,microwave frequencies,power added efficiency,power density,scaled HEMT technology,size 90.0 nm,solid-state technology,spectrum space,W-band applications
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