EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim,Jeongjin Lee,Seung Yoon Lee,Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh,Antonio Corradi,Yun-A Sung,Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII（2023）

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摘要

In this paper the use of the EPE metric directly in the process optimization method for a DRAM use case has been researched. We show that EPE-aware optimization, using scanner dose and overlay control sub-recipes, is outperforming conventional optimization in terms of EPE Dies in Spec. Hence, it can be expected that also device yield can be improved by EPE-aware control.

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关键词

Edge Placement Error, Optimization, Overlay, DRAM

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