16nm FinFET DUV Detector Array in Fully Compatible FinFET Logic Process

2023 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI-TSA/VLSI-DAT(2023)

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摘要
A new 16nm FinFET 2T DUV light detector array is successfully fabricated and demonstrated in this paper. Based on the photoelectric effect in floating gate cell design, the new DUV detector features full CMOS process compatibility with non-volatile detected data storage. A brand new analytical model is also developed for resolving the sensitivity variation aroused from different fab-out initial states. With this model, the FinFET detector array can successfully sense the exposed DUV intensity and its distribution precisely.
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关键词
CMOS process compatibility,deep ultra-violet light,DUV detector,exposed DUV intensity,FinFET 2T DUV light detector array,floating gate cell design,fully compatible FinFET logic process,nonvolatile detected data storage,photoelectric effect,sensitivity variation,size 16.0 nm
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