Optical multicoating using low-refractive-index SiO2 optical thin films deposited by sputtering and electron beam evaporation

Naoya Tajima,Hiroshi Murotani,Takayuki Matsudaira

Thin Solid Films（2023）

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摘要

•SiO2 film with a refractive index of 1.26 and withstands ultrasonic cleaning.•Monomaterial multilayers with only SiO2 with refractive indices of 1.46 and 1.30.•UV optical filter consists of 51 alternating layers of SiO2 on a SiO2 substrate.•Films were deposited by sputtering and electron beam evaporation simultaneously.

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关键词

Silicon dioxide, SiO2, Electron beam evaporation, Sputtering, Multi-layer film, Optical properties

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