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Actinic Inspection of the EUV Optical Parameters of Lithographic Materials with Lab-Based Radiometry and Reflectometry

Kevin Dorney, Nicola N. Kissoon,Fabian Holzmeier,Esben W. Larsen,Dhirendra P. Singh, Shikhar Arvind, Sayantani Santra,Roberto Fallica,Igor Makhotkin,Vicky Philipsen,Stefan De Gendt,Claudia Fleischmann,Paul A. W. van der Heide,John S. Petersen

Optical and EUV Nanolithography XXXVI（2023）

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