Chrome Extension
WeChat Mini Program
Use on ChatGLM
VIPCreated with Sketch.

Coater/developer-based Techniques to Achieve Tight Pitches Towards High-Na EUV

Kanzo Kato,Lior Huli,Nathan Antonovich,David Hetzer, Steven Grezeskowiak,Eric Liu,Akiteru Ko,Satoru Shimura,Shinichiro Kawakami,Takahiro Kitano,Seiji Nagahara,Luciana Meli,Indira Seshadri,Martin Burkhardt,Karen Petrillo

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL（2023）

Cited 1|Views2
Key words
Extreme ultraviolet lithography (EUVL),metal oxide resist (MOR),defectivity improvement
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined