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Design of New Block Copolymer Systems to Achieve Thick Films with Defect-Free Structures for Applications of DSA into Lithographic Large Nodes

X. Chevalier,P. Coupillaud, G. Lombard,C. Nicolet,J. Beausoleil,G. Fleury,M. Zelsmann,P. Bezard,G. Cunge,J. Berron,K. Sakavuyi,A. Gharbi,R. Tiron,G. Hadziioannou,C. Navarro,I. Cayrefourcq

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2016）

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