65Nm Technology for HEP: Status Et Perspective
V. Lemaı̂tre,M. Barbero,D. Fougeron,F. Gensolen,S. Godiot,M. Menouni,P. Pangaud,A. Rozanov,A. Wang,M. Bomben,G. Calderini,F. Crescioli,J. F. Genat, M. Lazzaroni,G. Marchiori, S. Watts,F. Rarbi,R. Gaglione,L. Gonella, W. Walkowiak,F. Huegging,M. Karagounis,T. Kishishita,Hans Krueger,P. Rymaszewski,N. Wermes,F. Ciciriello,F. Corsi,F. Licciulli,C. Marzocca,G. De Robertis,F. Loddo,C. Tamma,A. Andreazza,Valentino Liberali, S. Shojaii,A. Stabile,Marta Bagatin,C. Sciacca,Serena Mattiazzo, Ling Ding,Simone Gerardin,P. Giubilato,A. Neviani,A. Paccagnella,D. Vogrig,J. Wyss,N. Bacchetta,F. De Canio,L. Gaioni, S. Perriès,M. Manghisoni,G. Traversi,Daniele Comotti, V. Speziali,C. Vacchi,R. Beccherle,R. Bellazzini,E. Mazzoni,M. Minuti, F. Morsani,F. Palla,Luca Fanucci,Sergio Saponara,P. Azzurri, Gian Mario Bilei,M. Menichelli,E. Conti,S. Marconi,D. Passeri,P. Placidi, R. Covarelli,N. Demaria,G. Mazza,M. Rolo,Ennio Monteil,N. Pastrone,D. Gajanana,V. Gromov,N. P. Hessey,R. Kluit,V. Zivkovic,M. Havránek, R. Kass,M. Marčišovský,G. Neue, Vratislav Kafka,P. Šı́cho, M. Weber,I. Vila, M. A. Aguirre,F. Muñoz,F.R. Palomo,Duccio Abbaneo,J. Christiansen,D. Dannheim,D. Dobos,L. Linssen,H. Pernegger,N. Alipour Tehrani,S. Bell,M. Prydderch, Schuster Thomas, D. Christian, W. E. Cooper,Farah Fahim,J. Hoff,R. Lipton, T. Liu,T. Zimmerman,M. Garcia-Sciveres,D. Gnani,A. Mekkaoui,I. Gorelov,M. R. Hoeferkamp,S. Seidel,Š. Todorova-Nová,J. De Witt,S. Grinstein
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