Measurement of minority carrier diffusion length in p-GaN using electron emission spectroscopy (EES)
APPLIED PHYSICS LETTERS(2023)
摘要
Electron emission spectroscopy was performed on metalorganic chemical vapor deposition grown p-n(-)-n(+) junctions with p-thicknesses ranging from 50 to 300 nm, doped with [Mg] = 3.5 x 10(19) cm(-3). By measuring the decreasing emitted electron intensity from a cesiated p-GaN surface with increasing p-thickness, we were able to extract the minority carrier diffusion length of electron in p-type GaN, L-e = 2663 nm. The measured value is in good agreement with literature reported values. The extrapolated electron current at the n(-) region p-GaN interface is in reasonable agreement with the simulated electron current at the interface.
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关键词
minority carrier diffusion length,electron emission spectroscopy
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