CeO2-Doped Hf0.5Zr0.5O2 Ferroelectrics for High Endurance Embedded Memory Applications
Z. Yu,B. Saini,P. J. Liao,Y. K. Chang,V. Hou,C. H. Nien,Y. C. Shih,S. H. Yeong,V. Afanas'Ev,F. Huang,J. D. Baniecki,A. Mehta,C. S. Chang,H.-S. P. Wong,W. Tsai,P. C. McIntyre
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)（2022）
