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Corrections to “Low-Temperature Microwave Annealing Processes for Future IC Fabrication—A Review”

Yao-Jen Lee,Ta-Chun Cho,Shang-Shiun Chuang,Fu-Kuo Hsueh,Yu-Lun Lu,Po-Jung Sung,Hsiu-Chih Chen,Michael I. Current,Tseung-Yuen Tseng,Tien-Sheng Chao,Chenming Hu,Fu-Liang Yang

IEEE Transactions on Electron Devices（2023）

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Abstract
The above article [1] presented data on microwave annealing of implanted ions in silicon. There are several typos in the figure captions and labels, and the authors would like to correct them. The text is correct, and the conclusion of [1] is not impacted by these revisions.
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