Molecular Beam Epitaxy of Mixed h -GaTe/ m -GaTe Thin Films on GaAs(001) Substrates: Structural and Photoluminescence Properties
Journal of Experimental and Theoretical Physics(2023)
摘要
Thin GaTe films were grown by molecular beam epitaxy (MBE) on GaAs(001) substrates. X-ray powder diffraction confirmed the coexistence of the h - and m -GaTe phases in all grown layers. A quantitative correlation between the MBE growth conditions and the phase composition of the grown films is established, and the upper limit of the MBE growth temperature for thin GaTe/GaAs(001) films is experimentally determined. New data are presented confirming the defect-related origin of the broad emission line with an energy maximum of ~1.45–1.46 eV, which dominates the low-temperature photoluminescence spectra of the grown GaTe/GaAs(001) layers.
更多查看译文
关键词
GaTe,layered semiconductors,molecular-beam epitaxy,structural properties,photoluminescence,thin films
AI 理解论文
溯源树
样例
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要