Titanium oxide nanomaterials as an electron-selective contact in silicon solar cells for photovoltaic devices

To obtain high conversion efficiency, various carrier-selective contact structures are being applied to the silicon solar cell, and many related studies are being conducted. We conducted research on TiO 2 to create an electron-selective contact structure that does not require a high-temperature process. Titanium metal was deposited using a thermal evaporator, and an additional oxidation process was conducted to form titanium oxide. The chemical compositions and phases of the titanium dioxide layers were analyzed by X-ray diffraction. The passivation effects of each titanium oxide layer were measured using the quasi-steady-state photoconductance. In this study, the layer properties were analyzed when TiO 2 had a passivation effect on the silicon surface. The charge and interface defect densities of the layer were analyzed through CV measurements, and the passivation characteristics according to the TiO 2 phase change were investigated. As a result, by applying optimized TiO 2 layer thickness and annealing temperature conditions through the experiment for passivation to the cell-like structure, which is the structure before metal and electrode formation, an implied open-circuit voltage (iVoc) of 630 mV and an emitter saturation current density ( J 0 ) value of 60.4 fA/cm 2 were confirmed.