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EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

Cong Que Dinh,Seiji Nagahara,Yuhei Kuwahara,Arnaud Dauendorffer,Keisuke Yoshida,Soichiro Okada,Tomoya Onitsuka,Shinichiro Kawakami,Satoru Shimura,Makoto Muramatsu,Kosuke Yoshihara,John S. Petersen,Danilo De Simone,Philippe Foubert,Geert Vandenberghe,Lior Huli,Steven Grzeskowiak,Alexandra Krawicz,Nayoung Bae,Kanzo Kato,Kathleen Nafus,Angelique Raley

Journal of Photopolymer Science and Technology（2022）

Cited 5|Views27
Key words
EUV resist,MOR,Roughness,Collapsing,Bridging,Global CDU
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