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Process Optimization of Line Patterns in Extreme Ultraviolet Lithography Using Machine Learning and a Simulated Annealing Algorithm

Rongbo Zhao,Ziyu Hu,Xiaolin Wang,Peipei Tao,Yimeng Wang,Tianqi Liu,Yayi Wei,Hong Xu,Xiangming He

APPLIED OPTICS（2023）

Cited 4|Views35
Key words
Line Edge Roughness,Extreme Ultraviolet Lithography,High-Resolution Patterning,Texture Analysis,Resolution Limits
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