Impact of process variations on splitter-tree-based integrated optical phased arrays
OPTICS EXPRESS(2023)
摘要
We consider the impact of intra-wafer systematic spatial variation, pattern density mismatch, and line edge roughness on splitter-tree-based integrated optical phased arrays. These variations can substantially affect the emitted beam profile in the array dimension. We study the effect on different architecture parameters, and the analysis is shown to be consistent with experimental results.
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