Dispersion Kinetics of Thin Double Hafnium-Copper Films Deposited onto Oxide Materials and Annealed in Vacuum

Dispersion kinetics research of two-layer hafnium-copper coatings (films) onto oxide materials (leucosapphire, alumina, and zirconia ceramics) during annealing in vacuum at 900–1100 °C at different annealing time in the range of 2–20 min are describe. According to the research results, the kinetic curves of film dispersion are built. Based on these graphs, the parameters of the joining of metallized non-oxide materials by soldering were selected.