A World First QLC RRAM: Highly Reliable Resistive-Gate Flash with Record 108 Endurance and Excellent Retention
2023 IEEE International Reliability Physics Symposium (IRPS)(2023)
Abstract
In this paper, we demonstrated successfully a quad-level cell (QLC) of a resistive-gate memory. It was implemented in a 1k bits chip with integration of FinFET core on a mature logic platform. Comprehensive reliabilities have been examined. The results show the forming-free property, low programming current
$(< \mu \mathrm{A})$
, high endurance and excellent data retention. A record high 5×10
8
endurance can be achieved. Furthermore, a 4-bit-per-cell (16 levels) has been demonstrated successfully. The chip-level performance is also analyzed, showing well disturbance-immune during SET/RESET, READ, which kept healthy signal-to-noise margin, 2-3x. This architecture is a strong candidate for the next generation resistance memory.
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Key words
Resistance memory,RRAM,FinFET,RG-Flash,Quad-level Cell (QLC),Reliability
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