M-FOUP SYSTEM Performance in a Semiconductor Process Control

Yevgeny Lifshitz, Fahad Alhasawi,David Novack,Jack Downey,John Byrnes, Alfred Hajtman, Csaba Nándor Bitvai, Anna Bölcskei-Molnár, István Nemeth, Krisztina Kover,Peter Basa

2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)（2023）

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Advanced Metrology,Design Enablement,Device Development,M-FOUP SYSTEM,Fab-integrated metrology,film thickness

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