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Improvement in the storage stability of camphorquinone-based photocurable materials in sunlight via Z → E photoisomerization of photomask agent

Jingfang Li,Hongxiu Wu,Yian Chen,Kewei Cao,Yang Li,Qiusen Ding,Xianju Zhou,Zhicheng Fu,Jun Nie,Xiaoqun Zhu

Progress in Organic Coatings（2023）

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Abstract
The improved storage stability of camphorquinone (CQ)-based photocurable materials in sunlight was demonstrated due to the photomask agent E-HPO/Z-HPO exhibiting a wide absorption profile and large molar extinction coefficient to inhibit CQ. In addition, CQ could be activated as Z-HPO transformed into E-HPO upon LED465nm irradiation with high light intensity and the mechanism was proposed.
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Key words
Photopolymerization,Camphorquinone,Photomask agent,Storage stability to sunlight
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