The influences of current density on chemical composition and magnetic properties of FeNi x film prepared by electrodeposition

Soft magnetic film with high saturation magnetization ( M s ) and low coercivity ( H c ) is a critical class of material for RF inductors, which can enhance the inductance when inserted into film inductor. In this study, a series of micron-scale FeNi x film are prepared via an electroplating process. The phase and element composition of the as-prepared FeNi x films are analyzed through the X-ray diffraction (XRD) and energy dispersive spectroscopy (EDS), respectively. Results demonstrate that the iron nickel ratio of FeNi x films can be adjusted by controlling the current density. The higher current density caused high nickel content, which may controllably prepare a series of micro-scale FeNi x film. Moreover, SEM images and AFM photograph show that the films have no obvious defects and have a small roughness. We also found that the micron-scale FeNi x film (~ 2.5 μm) presents high saturation magnetization ( M s = 1289.0 emu/cm 3 ) and low coercivity ( H c = 76.8 A/m), which is feasible for magnetic core of RF inductors. Also, the electroplating method that preparing micro-scale FeNi x film with controllable elemental composition can provide a referential experience for other soft magnetic film.