The FMR line width and the structure in YIG films deposited by MOD on silicon (100)

In this work, yttrium-iron garnet (YIG) films deposited on silicon subtract were studied by ferromagnetic resonance (FMR). The samples were prepared by using the Metal-Organic Decomposition (MOD) method on two different thermal treatments (750 degrees C and 850 degrees C). The X-ray diffraction suggested the single phase of YIG while atomic force microscopy and scanning electron microscopy reveled film roughness, R-q < 0.2 nm. The FMR measurements showed very different linewidth of 139 Oe for the sample obtained at 750 degrees C and sample at 850 degrees C had a smaller linewidth of 93 Oe. The difference was mainly attributed to the different structural ordering of the two samples from the heat treatment at different temperatures.