MIA-aware Detailed Placement and VT Reassignment for Leakage Power Optimization

As the feature size decreases, leakage power consumption becomes an important target in the design. Using multiple threshold voltages (VTs) in cell-based designs is a popular technique to simultaneously optimize circuit timing and minimize leakage power. However, an arbitrary cell placement result of a multi-VT design may suffer from many design rule violations induced by the Minimum-Implant-Area (MIA) rule, and thus it is necessary to take the MIA rules into consideration during the detailed placement stage. The state-of-the-art works on detailed placement comprehensively tackling MIA rules either disallow VT change or only allow reducing cell VTs to avoid timing degradation. However, these limitations may either result in larger cell displacement or cause overhead in leakage power. In this paper, we propose an optimization framework of VT reassignment and detailed placement to simultaneously consider MIA rules and leakage power minimization under timing constraints. Experimental results show that compared with the state-of-the-art works, the proposed framework can efficiently achieve better trade-off between leakage power and cell displacement.