Raman scattering studies of low energy Ar+ ion implanted monocrystalline silicon for synchrotron applications

N. Kumar,V.A. Volodin, S.V. Goryainov,A.K. Chernyshev, A.T. Kozakov, A.A. Scrjabin,N.I. Chkhalo,M.S. Mikhailenko,A.E. Pestov,M.V. Zorina

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS（2023）

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摘要

•Ar+ ion implantation and modification of surface/subsurface microstructures.•Polarized and multiwavelength Raman spectroscopic study of modified surfaces.•Implantation induced transformation of monocrystalline Si to amorphous and nanocrystalline Si.

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关键词

Ar+ ion implantation,Monocrystalline silicon,Raman spectroscopy

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